M05600 - SEMI M56 - 計量装置の測定変動と偏りに起因する費用成分の作業法 StdPbc-0522 SEMI P48-1110 (Reapproved 1221)

SEMI P48-1110 (Reapproved 1221)

Wafer parameters as defined by SEMI M1

orgで入手可能になり，2003年7月発行に至る。初版は1995年発行。

The developmental wafers covered by this specification are intended for use in research and development of process and metrology equipment and fabrication processes required for manufacturing high-density integrated circuits on 450 mm diameter single crystal silicon wafers

SEMI MF84 –– Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe

M05600 - SEMI M56 - 計量装置の測定変動と偏りに起因する費用成分の作業法 StdPbc-0522 SEMI P48-1110 (Reapproved 1221)global Silicon Wafer Committee20061121global Audits and Reviews Subcommittee20072www. semi. org20073CD ROM200311 11 P TP T Referenced SEMI Standards SEMI E35 Guide to Calculate Cost of Ownership (COO) Metrics for Semiconductor Manufacturing Equipment SEMI E89 Guide for Measurement System Analysis (MSA) SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers S EMI M59 Terminology for Silicon Technology